TechBlog

The U.S. Air Force Research Laboratory has authorized Raytheon Company to demonstrate target recognition technology designed to increase protection for ground forces without compounding risk to an aircraft stalking enemies who threaten those forces.

First in a laboratory and then aloft, the company expects to show how its Air-to-Ground Radar Imaging II program would permit aircraft at a safe distance to detect, track and target hostile forces in motion on the ground.

The laboratory demonstration is expected in autumn 2008, followed by a flight next spring aboard a Raytheon test aircraft.

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WRIGHT-PATTERSON AIR FORCE BASE, Ohio (AFPN) — Engineers here are testing a new kind of transparent armor — stronger and lighter than traditional materials — that could stop armor-piercing weapons from penetrating vehicle windows.

The Air Force Research Laboratory’s materials and manufacturing directorate is testing aluminum oxynitride — ALONtm — as a replacement for the traditional multi-layered glass transparencies now used in existing ground and air armored vehicles.

The test is being done in conjunction with the Army Research Laboratory at Aberdeen Proving Grounds, Md., and University of Dayton Research Institute, Ohio.

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New technology ‘dazzles’ aggressors: “A laser technology weapon will be the first man-portable, non-lethal deterrent weapon intended for protecting troops and controlling hostile crowds.

The weapon, developed by the Air Force Research Laboratory’s Directed Energy Directorate, employs a two-wavelength laser system and is a hand-held, single-operator system for troop and perimeter defense. The laser light used in the weapon temporarily impairs aggressors by illuminating or ‘dazzling’ individuals, removing their ability to see the laser source. “

Woodbury, NY — Veeco Instruments Inc., announced the introduction of its new InSight 3D Automated Atomic Force Microscope (AFM) Platform, the only metrology system available with the accuracy and precision required for non-destructive, high resolution three-dimensional (3D) measurements of critical 45nm and 32nm semiconductor features, with the speed to qualify as a true fab tool. Veeco’s InSight 3DAFM was designed specifically to address Critical Dimension (CD), depth and chemical mechanical planarization (CMP) metrology in a production environment.John R. Peeler, Chief Executive Officer of Veeco, commented, “With three times the throughput (30 wafers per hour) and two times the measurement accuracy and precision of our previous AFMs, Veeco’s InSight represents an entirely new approach for semiconductor 3D metrology. It is the only tool on the market today providing in-line, accurate, non-destructive 3D information, to drive shorter process development and manufacturing ramp times, improve our customers’ cost of ownership and decrease their manufacturing risk.”

“At 45nm and below, current in-line metrology techniques are limited in their ability to measure CD,” added Paul Clayton, Vice President, Veeco’s Auto AFM Business Unit. “Technologies such as CD-SEM and scatterometry are precise, but not accurate enough, causing significant measurement issues. Veeco’s InSight provides the lowest measurement uncertainty for CD metrology, which leads to improved process control.”

About InSight 3DAFM
The InSight 3DAFM features a completely new metrology platform designed to meet the stringent requirements of 45 and 32nm semiconductor metrology applications such as CD, sidewall angle and line width roughness on critical layers such as Gate and FinFet structures. The system contains a new high-precision X-Y stage with improved accuracy and a new pattern recognition system with high-precision laser auto-focus capability. In addition, new AFM control techniques and new probe designs enable improved precision, lower cost per measurement site and smaller feature measurement. Finally, system reliability is significantly enhanced to meet the demands of 45nm production-based metrology.

The National Institute of Standards and Technology (NIST) has issued its first reference standards for nanoscale particles targeted for the biomedical research community—literally “gold standards” for labs studying the biological effects of nanoparticles. The three new materials, gold spheres nominally 10, 30 and 60 nanometers in diameter, were developed in cooperation with the National Cancer Institute’s Nanotechnology Characterization Laboratory (NCL).

Nanosized particles are the subject of a great deal of biological research, in part because of concerns that in addition to having unique physical properties due to their size, they also may have unique biological properties. On the negative side, nanoparticles may have special toxicity issues. On the positive side, they also are being studied as vehicles for targeted drug delivery that have the potential to revolutionize cancer treatments. Research in the field has suffered from a lack of reliable nanoscale measurement standards, both to ensure consistency of data from one lab to the next and to verify the performance of measurement instruments and analytic techniques.

False color scanning electron micrograph (250,000 times magnification) showing the gold nanoparticles created by NIST and the National Cancer Institute’s Nanotechnology Characterization Laboratory for use as reference standards in biomedical research laboratories.The new NIST reference materials are citrate-stabilized nanosized gold particles in a colloidal suspension in water. They have been extensively analyzed by NIST scientists to assess particle size and size distribution by multiple techniques for dry-deposited, aerosol and liquid-borne forms of the material. Dimensions were measured using six independent methods—including atomic force microscopy (AFM), transmission electron microscopy (TEM), scanning electron microscopy (SEM), differential mobility analysis (DMA), dynamic light scattering (DLS), and small-angle X-ray scattering (SAXS). At the nanoscale in particular, different measurement techniques can and will produce different types of values for the same particles.

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